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{Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes}

2012

Article

mms


Author(s): Nadzeyka, A. and Peto, L. and Bauerdick, S. and Mayer, M. and Keskinbora, K. and Grévent, C. and Weigand, M. and Hirscher, M. and Schütz, G.
Journal: {Microelectronic Engineering}
Volume: 98
Pages: 198--201
Year: 2012

Department(s): Modern Magnetic Systems
Bibtex Type: Article (article)

DOI: 10.1016/j.mee.2012.07.036
Language: eng

BibTex

@article{escidoc:0276,
  title = {{Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes}},
  author = {Nadzeyka, A. and Peto, L. and Bauerdick, S. and Mayer, M. and Keskinbora, K. and Gr\'event, C. and Weigand, M. and Hirscher, M. and Sch\"utz, G.},
  journal = {{Microelectronic Engineering}},
  volume = {98},
  pages = {198--201},
  year = {2012}
}