Comparative study of ALD SiO2 thin films for optical applications
2016
Article
mms
Author(s): | Pfeiffer, K. and Shestaeva, S. and Bingel, A. and Munzert, P. and Ghazaryan, L. and van Helvoirt, C. and Kessels, W. M. M. and Sanli, U. T. and Grévent, C. and Schütz, G. and Putkonen, M. and Buchanan, I. and Jensen, L. and Ristau, D. and Tünnermann, A. and Szeghalmi, A. |
Journal: | {Optical materials express} |
Volume: | 6 |
Number (issue): | 2 |
Pages: | 660--670 |
Year: | 2016 |
Publisher: | OSA |
Department(s): | Modern Magnetic Systems |
Bibtex Type: | Article (article) |
Address: | Washington, DC |
DOI: | 10.1364/OME.6.000660 |
Language: | eng |
BibTex @article{escidoc:0071, title = {{Comparative study of ALD SiO2 thin films for optical applications}}, author = {Pfeiffer, K. and Shestaeva, S. and Bingel, A. and Munzert, P. and Ghazaryan, L. and van Helvoirt, C. and Kessels, W. M. M. and Sanli, U. T. and Gr\'event, C. and Sch\"utz, G. and Putkonen, M. and Buchanan, I. and Jensen, L. and Ristau, D. and T\"unnermann, A. and Szeghalmi, A.}, journal = {{Optical materials express}}, volume = {6}, number = {2}, pages = {660--670}, publisher = {OSA}, address = {Washington, DC}, year = {2016}, doi = {10.1364/OME.6.000660} } |